In situ scanning tunneling microscopy (STM), atomic force microscopy (AFM) and quartz crystal microbalance (EQCM) studies of the electrochemical deposition of tantalum in two different ionic liquids with the 1-butyl-1-methylpyrrolidinium cation

- Carstens, Timo; Ispas, Adriana; Borisenko, Natalia; Aitken, Rob; Bund, Andreas; Endres, Frank

Title
In situ scanning tunneling microscopy (STM), atomic force microscopy (AFM) and quartz crystal microbalance (EQCM) studies of the electrochemical deposition of tantalum in two different ionic liquids with the 1-butyl-1-methylpyrrolidinium cation
Creator
Carstens, Timo; Ispas, Adriana; Borisenko, Natalia; Aitken, Rob; Bund, Andreas; Endres, Frank
Relation
Electrochimica Acta Vol. 197, p. 374-387
Publisher Link
http://dx.doi.org/10.1016/j.electacta.2015.07.178
Publisher
Pergamon Press
Resource Type
journal article
Date
2016
Description
The electrochemical reduction of 0.1 M TaF5 in two hydrophobic ionic liquids (1-butyl-1-methylpyrrolidinium tris(pentafluoroethyl) trifluorophosphate ([Py1,4]FAP) and 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl) amide ([Py1,4]TFSA) is probed using three in situ techniques: scanning tunneling microscopy (STM), atomic force microscopy (AFM), and electrochemical quartz crystal microbalance (EQCM). These techniques reveal that under similar conditions TaF5is more easily reduced in the liquids with [TFSA]− than [FAP]−anions. Increasing the temperature reduced the viscosity and density of the ionic liquids which facilitates TaF5 electroreduction, in particular, in [Py1,4]TFSA. A herringbone reconstruction of the Au electrode was observed by STM for both ionic liquids with and without TaF5. Ta deposition was proved by STM and EQCM in [Py1,4]TFSA. Cracked layers, with ionic liquid trapped inside, were obtained by direct plating from the [TFSA]− ionic liquid. No Ta containing deposits could be obtained in the liquid with the [FAP]− anion.
Subject
ionic liquid; electrodeposition; tantalum; STM; AFM
Identifier
http://hdl.handle.net/1959.13/1310831
Identifier
uon:22100
Identifier
ISSN:0013-4686
Language
eng
Full Text
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